CVD Equipment Corporation (CVV)
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No price history available.
Key financial summary
Financials in USD| 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | TTM | 2026E | ||
|---|---|---|---|---|---|---|---|---|---|
| Total revenue | $m | 17 | 16 | 26 | 24 | 27 | 26 | 16 | 30 |
| Operating profit | $m | -2 | -4 | ||||||
| Net profit | $m | -6 | 5 | -0 | -4 | -2 | -2 | - | -0 |
| EPS reported | $ | -0.23 | 1.45 | ||||||
| Operating cashflow per share | $ | -0.53 | 0.07 | ||||||
| Capex per share | $ | 0.01 | 0.00 | ||||||
| FCF per share | $ | -0.54 | 0.07 | ||||||
| Free cash flow | $m | -4 | 0 | ||||||
| Net debt | $m | -9 | -23 | ||||||
| Book value equity | $m | 25 | 36 | ||||||
| Book value per share | $ | 3.60 | 5.20 | ||||||
| Number of shares | m | 6.88 | 6.93 | ||||||
| DPS (TTM paid) | $ | 0.00 | 0.00 |
Financial summary
Financials in USD| 2020 | 2021 | 2022 | 2023 | 2024 | 2025 | TTM | 2026E | ||
|---|---|---|---|---|---|---|---|---|---|
| Value | |||||||||
| P/E TTM | x | - | 2.97 | ||||||
| P/B LTM | x | 0.86 | 0.59 | ||||||
| P/S LTM | x | 0.82 | 1.31 | ||||||
| P/FCF LTM | x | -5.70 | 45.78 | ||||||
| EV/EBITDA LTM | x | -14.32 | -3.74 | ||||||
| EV/Sales LTM | x | 0.49 | 1.37 | ||||||
| Earnings Yield LTM | % | -7.46% | +33.67% | ||||||
| FCF Yield | % | -17.54% | +2.18% | ||||||
| Quality | |||||||||
| ROE | % | -6.41% | +36.49% | ||||||
| ROIC | % | -7.01% | -11.63% | ||||||
| Operating margin | % | -6.77% | -26.47% | ||||||
| Gross margin | % | +28.26% | +24.73% | ||||||
| FCF/Sales | % | -14.45% | +2.87% | ||||||
| Growth and momentum | |||||||||
| EPS Growth YoY | % | - | - | ||||||
| Sales Growth YoY | % | -4.06% | -39.89% | ||||||
| Net Income Growth YoY | % | - | - | ||||||
| FCF Growth | % | - | - | ||||||
| Operating Profit Growth | % | - | - | ||||||
| Dividend and capital structure | |||||||||
| Dividend Yield | % | 0.00% | 0.00% | ||||||
| Dividend Growth | % | - | - | ||||||
| Payout Ratio | % | 0.00% | 0.00% | ||||||
| FCF/Debt | x | -20.59 | - | ||||||
| Net Debt/EBITDA | x | 9.65 | 6.93 | ||||||
| EBIT/Net interest | x | -134.38 | -611.00 | ||||||
| Net debt/market cap | % | +0.85% | 0.00% | ||||||
| Net debt/Equity | x | -0.35 | -0.65 | ||||||
| Gross debt/equity | x | 0.01 | 0.00 | ||||||
Price target estimates
Based on consensus from external analysts. Not Kvantra's opinion.
Ratings
Based on consensus from external analysts. Not Kvantra's opinion.
ESG
| Metric | 2024 | 2025 | 2026 |
|---|---|---|---|
| ESG-score | |||
| Environmental score | |||
| Social score | |||
| Governance score | |||
| Risk rating |
Company overview
CVD Equipment Corporation, along with its affiliated entities, specializes in the engineering, manufacturing, and distribution of sophisticated process equipment and comprehensive solutions. These offerings are instrumental in the creation and fabrication of advanced materials and specialized coatings, catering to both research institutions and industrial sectors, predominantly within the United States. The company operates through three distinct divisions: CVD, SDC, and CVD Materials. Its extensive product portfolio features: Chemical Vapor Deposition (CVD) Systems: These are vital for the research, development, and production across diverse fields such as aerospace, medical components, semiconductors, LED technology, carbon nanotubes, nanowires, solar cells, and various other industrial applications. Rapid Thermal Processing Systems: Utilized for critical processes including implant activation, oxidation, and silicide formation. Furnaces: Encompassing annealing, diffusion, and low-pressure chemical vapor deposition models, employed in diffusion, oxidation, implant annealing, solder reflow, and solar cell manufacturing. Gas and Liquid Control Systems: This category includes gas cylinder storage cabinets, bespoke gas and chemical delivery setups, valve manifold boxes for gas and liquids, and gas isolation boxes, all crucial for semiconductor fabrication, solar cell production, LEDs, carbon nanotubes, nanowires, and general industrial use. Quartz-ware: Both standard and custom-fabricated items, often integrated into the company's own equipment or supplied for other customer tools, complemented by repair and replacement services. MesoPlasma Direct Write Printing: An innovative material deposition technique enabling the creation of instrumentation, intricate patterns, and coatings on complex, conformal surfaces. Tantaline Corrosion-Resistant Coatings: Applied to enhance the durability of components like valves, fittings, fasteners, vessels, bellows, and other custom-designed items. Additional Materials: The company also provides carbon composites and various electronic materials. CVD Equipment Corporation's clientele primarily consists of organizations in the aerospace and defense sectors, the medical industry, electronic component manufacturers, academic institutions, as well as government and private industrial laboratories. Established in 1982, the company maintains its headquarters in Central Islip, New York.
Similar companies
For informational purposes only. Kvantra provides data and quantitative analysis, not investment advice. KvantraRank is a mechanical model output. Analyst price targets and ratings are sourced from third parties and are not Kvantra recommendations. Past performance does not guarantee future results; all investments carry risk.
No price history available.
Consensus from external analysts. Not Kvantra's opinion.
Based on consensus from external analysts. Not Kvantra's opinion.
CVD Equipment Corporation, along with its affiliated entities, specializes in the engineering, manufacturing, and distribution of sophisticated process equipment and comprehensive solutions. These offerings are instrumental in the creation and fabrication of advanced materials and specialized coatings, catering to both research institutions and industrial sectors, predominantly within the United States. The company operates through three distinct divisions: CVD, SDC, and CVD Materials. Its extensive product portfolio features: Chemical Vapor Deposition (CVD) Systems: These are vital for the research, development, and production across diverse fields such as aerospace, medical components, semiconductors, LED technology, carbon nanotubes, nanowires, solar cells, and various other industrial applications. Rapid Thermal Processing Systems: Utilized for critical processes including implant activation, oxidation, and silicide formation. Furnaces: Encompassing annealing, diffusion, and low-pressure chemical vapor deposition models, employed in diffusion, oxidation, implant annealing, solder reflow, and solar cell manufacturing. Gas and Liquid Control Systems: This category includes gas cylinder storage cabinets, bespoke gas and chemical delivery setups, valve manifold boxes for gas and liquids, and gas isolation boxes, all crucial for semiconductor fabrication, solar cell production, LEDs, carbon nanotubes, nanowires, and general industrial use. Quartz-ware: Both standard and custom-fabricated items, often integrated into the company's own equipment or supplied for other customer tools, complemented by repair and replacement services. MesoPlasma Direct Write Printing: An innovative material deposition technique enabling the creation of instrumentation, intricate patterns, and coatings on complex, conformal surfaces. Tantaline Corrosion-Resistant Coatings: Applied to enhance the durability of components like valves, fittings, fasteners, vessels, bellows, and other custom-designed items. Additional Materials: The company also provides carbon composites and various electronic materials. CVD Equipment Corporation's clientele primarily consists of organizations in the aerospace and defense sectors, the medical industry, electronic component manufacturers, academic institutions, as well as government and private industrial laboratories. Established in 1982, the company maintains its headquarters in Central Islip, New York.
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